Purion M™ mid current implanter, Purion H™ high current implanter, and Purion XE™ high energy implanter are designed for advanced 3D devices. Systems include Purion Contamination Shield™ for lowest particles, undetectable metals, and no energy contamination; Purion Vector™ Dose and Angle Control system for precise and repeatable dopant placement; as well as Purion 500wph endstation cross-platform architecture that promotes productivity and manufacturing flexibility.
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