Using HELIOS-500, near atomically clean surfaces can be achieved in minutes without damage to devices. System includes UV grid lamp, digital process timer, and hour-counter that records UV lamp usage for maintenance purposes. During photo-sensitized oxidation process, contaminant molecules of photo resists, resins, human skin oil, cleaning solvent residues, silicone oils, and flux are excited and/or dissociated by absorption of short wavelength UV radiation.
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