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CyberOptics Presents How to Quickly Identify and Resolve Particle...

2015-04-14 13:05:14| Electronics - Topix.net

Apr 13, 2015--CyberOptics R Corporation , a leading global developer and manufacturer of high precision 3D sensing technology solutions, will present at The 22 nd Symposium on Photomask and NGL Mask Technology in Yokohama, A poster presentation on Tuesday, April 21, from 17:25-19:10 will feature Mr. Yukinobu Hayashi, Field Application Engineer for CyberOptics, discussing how to increase efficiency and effectiveness of processes related to airborne particles in reticle mask environments. "Minimizing airborne particles in lithography applications remains a challenge if using traditional surface scan reticles, in-situ or hand-held methods.

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Category:Electronics and Electrical

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