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Open Source Digital Cell Library aids with 15 nm process.

2014-06-06 14:30:33| Industrial Newsroom - All News for Today

With library IP developed based on North Carolina State University's FreePDK 15 nm open-source, non-manufacturable process, 15 nm open cell library (OCL) can aid such challenges as designing with FinFET transistors, metal double patterning, advanced interconnect layers, and metal gate restrictions. Set of core cells and views enabling EDA RTL-GDSII tool flow include Liberty™ (.lib) with NLDM, CCS and ECSM models, LEF, Verilog, GDSII, CDL/Spice, HTML Datasheet, and others required to run other EDA tools. This story is related to the following:Online Databases

Tags: open source process digital

Category:Industrial Goods and Services

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