Seeing double: TSMC adopts new lithography technique to push Moores law to 20nm

Home › Seeing double: TSMC adopts new lithography technique to push Moores law to 20nm

TSMC is planning to adopt double patterning extensively at 20nm, despite the high cost of doing so. Why? Because EUV hasn't come through.

28.06	Cattle producers celebrate Supreme Court decision to rein in administrative overreach
28.06	Diversified Labeling Solutions expands RFID capabilities
28.06	Eastern North Pacific Tropical Weather Outlook
28.06	Atlantic Tropical Weather Outlook
28.06	Commitment leads to success in cattle marketing
28.06	Kurz opens new facility in Germany
28.06	Apex invests in Schepers laser engraving technology
28.06	All4Labels opens first factory in Northeast Brazil
More »

je.st