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Stanford Researchers Advance Area Selective Atomic Layer Deposition To Develop Higher Performing, More Energy Efficient Electronics

2016-01-14 01:04:46| chemicalonline Home Page

Stanford University researchers sponsored by Semiconductor Research Corporation (SRC), the world’s leading university-research consortium for semiconductor technologies, have developed a new area selective atomic layer deposition (ALD) process that promises to accelerate the manufacturing of higher performing, more energy efficient semiconductors

Tags: area electronics higher energy

Category:Chemicals

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