There are three fabrication techniques used in generating simple three-element 250 MHz low pass filter (LPF) designs. In each scenario, the filter is fabricated using the passive lumped element values obtained in the ideal LPF design process. Due to parasitic effects at high frequencies, the expected measured data will differ from the ideal LPF design. Parasitic elements will then be added incrementally to the design in order to illustrate the progression towards better measured to model agreement. This application note provides a comparison of a “good, better, best” progression through these fabrication techniques.