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Turbomolecular Vacuum Pump prevents powder deposition.

2014-02-24 14:31:27| Industrial Newsroom - All News for Today

Pairing rotor with iXA Series on-board controller, Model STP-iXA4506 maximizes allowable gas throughput for high-flow processes. Absence of mechanical bearings virtually eliminates periodic maintenance. Operating at speeds up to 4,300 l/s N2 with throughput up to 4,330 sccm N2, pump is suitable for semiconductor etch, LCD etch, glass coating, solar PVD, and coating PVD applications. When needed, thermal management system can be added to minimize accumulation of deposits and particulates. This story is related to the following:Chemical Processing and Waste ManagementSearch for suppliers of: Turbomolecular Pumps

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