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New world record efficiency for thin film silicon solar cells
2013-02-12 19:31:00| Climate Ark Climate Change & Global Warming Newsfeed
ScienceDaily: EPFL's Institute of Microengineering has reached a remarkable 10.7% efficiency single-junction microcrystalline silicon solar cell, clearly surpassing the previous world record of 10.1% held by the Japanese company Kaneka Corporation since 1998. Such significant efficiency, independently certified by the Fraunhofer Institute for Solar Energy Systems (ISE CalLab PV Cells), was achieved in addition with less than 2 micrometers of photovoltaic active material. The Photovoltaics-Laboratory (PV-Lab)...
New world record efficiency for thin film silicon solar cells
2013-02-12 11:00:00| LifeSciencesWorld
[NEWS] Contact: Simon Hänni simon.haenni@epfl.ch 41-327-183-228 Ecole Polytechnique Fédérale de Lausanne A 10.7 percent conversion rate has been achieved using less than 2 micrometers of raw material The Photovoltaics-Laboratory (PV-Lab) of EPFL's Insitute of Microengineering (IMT), founded in 1…
Thin Film Chip Resistors feature resistance down to 1 Ohm.
2013-02-11 14:32:44| Industrial Newsroom - All News for Today
Supplied in 0406 package, MCW 0406 AT Precision Series provides precision tolerance of ±0.1% and precision TCR of ±25 ppm/K. AEC-Q200-qualified units offer high-temperature performance to +155°C and power dissipation of 250 mW at ambient temperature of 70°C. On 4-layer FR4 printed circuit board, devices handle up to 2,500 cycles of rapid temperature change over span of -40 to +125°C. Typical applications include power measurement in industrial and automotive electronics. This story is related to the following:Thin Film Resistors |
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Advanced Thin Film Technologies
2013-02-11 12:17:22| rfglobalnet Home Page
This brochure includes information on Spectrum Microwave’s (API Technologies’) advanced thin film technologies capabilities. This includes their NiChrome/Tantalum Nitride (TaN) Resistors, polyimide bridges and dams, sputtering capabilities, thin film chip resistors, and more.
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DSI Announces Specialized LPCVD Thin Film Coating Process for Complex Shapes/Surfaces
2013-02-01 06:00:00| Industrial Newsroom - All News for Today
DSI Announces Specialized LPCVD Thin Film Coating Process for Complex Shapes/Surfaces Santa Rosa, CA - Deposition Sciences, Inc. (DSI®), global manufacturer of highly durable thin film optical coatings, announces the enhanced capability to apply highly specialized, durable coatings onto extremely complex shapes and multifaceted surfaces. Utilizing DSI's proprietary IsoDyn(TM) LPCVD (low pressure chemical vapor deposition), this method is ideal for coating almost all types of optical glass ...This story is related to the following:Chemical Vapor Deposition (CVD) Systems |
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