Featuring all-metal 316LSS construction that can be heated to 450°C, FLP Series is suited for filtering low pressure, vapor phase dopants used in metal-organic vapor phase epitaxyor, advanced chemical vapor deposition, and atomic layer deposition applications. Open filter media enables passage of low pressure liquid source gas while having enough surface area to remove particles down to 0.003 µm, and is effective at preventing large particle agglomerations from migrating downstream.<br />
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