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Cadence and Applied Materials Collaborate on Joint Development Program to Optimize Planarization Process through Advanced CMP Modeling
2015-06-25 12:31:09| Industrial Newsroom - All News for Today
SAN JOSE, Calif. and SANTA CLARA, Calif. Cadence Design Systems, Inc. (NASDAQ: CDNS) and Applied Materials, Inc. (NASDAQ: AMAT) today announced the companies are collaborating on a development program to optimize the chemical-mechanical planarization (CMP) process through silicon characterization and modeling for...
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Category:Industrial Goods and Services
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