Home › Dow Electronic Materials Launches New IKONIC 4000 Series CMP Polishing Pads For Ceria Polishing Applications
 

Keywords :   


Dow Electronic Materials Launches New IKONIC 4000 Series CMP Polishing Pads For Ceria Polishing Applications

2014-02-14 05:26:36| chemicalonline Home Page

Dow Electronic Materials, a business unit of The Dow Chemical Company, recently introduced the IKONIC 4000 series of chemical mechanical planarization (CMP) polishing pads.

Tags: series applications electronic materials

Category:Chemicals

Latest from this category

All news
12.11Benjamin Moore Expands Partnership with Roadie to Accelerate Paint Delivery for DIYers and Pros
11.11Clariant Launches Melamine-free Flame Retardant for Intumescent Coatings
11.11Protech Group Acquires Caldwell Chemical Coatings
11.11Asian Paints Reports 2Q 2024-25 Fiscal Results
10.11Clariant Launches Melamine-free Flame Retardant for Intumescent Coatings
09.11Weekly Recap: Nippon Paint, AkzoNobel, PPG Top This Weeks Stories
08.11Statement from the U.S. Green Building Council on the 2024 Election Results
08.11Axalta Celebrates the Opening of its Global Headquarters in the Philadelphia Navy Yard
Chemicals »
16.11HestraFallLine3
16.11GBA
16.11 SKY PAD 3.0 XL
16.1125th
16.112022taxDVD
16.11
16.11
16.11 e
More »