Home › Electron Beam Metallization System ensures uniformity.
 

Keywords :   


Electron Beam Metallization System ensures uniformity.

2013-04-12 14:29:51| Industrial Newsroom - All News for Today

Intended for lift-off compound semiconductor applications, Temescal UEFC-5700 incorporates Auratus™ Deposition Process Enhancement Methodology, offering near-perfect uniformity. System features conical shaped vacuum chamber and patent-pending High-Uniformity Lift-off Assembly design that uses dual-axis motion to optimize collection efficiency. With 44,000 L/sec of installed cryogenic pumping capacity, UEFC-5700 offers production capacity up to forty-two 150 mm wafers in batch. This story is related to the following:Semiconductor Processing Equipment | Electron Beam (EB) Machinery

Tags: system ensures electron beam

Category:Industrial Goods and Services

Latest from this category

All news
31.10Consolidated Financial Statements for the six-month period ended September 30, 2024
31.10Notice regarding the revision of the business results forecasts
Industrial Goods and Services »
05.11NI rise hits workers harder than employers, says OBR
05.11Tropical Storm Rafael Graphics
05.11Tropical Storm Rafael Wind Speed Probabilities Number 8
05.11Tropical Storm Rafael Public Advisory Number 8
05.11Summary for Tropical Storm Rafael (AT3/AL182024)
05.11Tropical Storm Rafael Forecast Advisory Number 8
05.11Lenzing Expands Nonwovens Range
05.11Netflix Europe offices raided in tax fraud probe
More »