Incorporating Purion Contamination Shield™ Defense System, Purion XE™ High Energy Implanter offers metals-free implant process that is designed specifically to address needs of image sensor and specialty device manufacturers. Purion Vector™ dose and angle control system, and constant focal length scanning deliver precise and repeatable dopant placement. In addition, optimized beam current performance combined with Purion™ 500 wph end station maximizes productivity.