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Ion Implanter offers extended energy option.

2015-10-19 14:31:08| Industrial Newsroom - All News for Today

Incorporating Purion Contamination Shield™ Defense System, Purion XE™ High Energy Implanter offers metals-free implant process that is designed specifically to address needs of image sensor and specialty device manufacturers. Purion Vector™ dose and angle control system, and constant focal length scanning deliver precise and repeatable dopant placement. In addition, optimized beam current performance combined with Purion™ 500 wph end station maximizes productivity.

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Category:Industrial Goods and Services

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