Built on Unity Platform™, Model LSA201 includes patented micro chamber design, which enables full-wafer ambient control in scanning laser system and does not require use of vacuum hardware. System is capable of running mixtures of any inert gases, but micro-chamber architecture is extendible to more reactive gases for future processes. LSA201 is suitable for interface engineering and film property modification where ambient control is critical at sub-20 nm.
This story is related to the following:Wafer Processing Systems