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Laser Spike Anneal System enables ambient control.
2013-06-27 14:28:57| Industrial Newsroom - All News for Today
Built on Unity Platform™, Model LSA201 includes patented micro chamber design, which enables full-wafer ambient control in scanning laser system and does not require use of vacuum hardware. System is capable of running mixtures of any inert gases, but micro-chamber architecture is extendible to more reactive gases for future processes. LSA201 is suitable for interface engineering and film property modification where ambient control is critical at sub-20 nm. This story is related to the following:Wafer Processing Systems
Tags: system
control
laser
enables
Category:Industrial Goods and Services