Equipped with Atomic Layer Deposition valves that can be heated to over 400°C, Picohot™ 400 enables efficient delivery of both solid and liquid low volatility chemicals in large doses optimal for batch processing. Source is especially suitable for metal chloride precursors, ensuring particle-free processing of hafnium oxide and many other materials on up to 300 mm wafers. Large internal volume of source container guarantees long, continuous process uptime with effective precursor utilization.