(Telecompaper) Samsung Electronics has announced the launch of wafer production on its next process node: 7-nanometer (nm) LPP (Low Power Plus) with extreme ultraviolet (EUV) lithography technology. In a statement the company said 7nm LPP EUV is a significant advance on 10nm processes, allowing up to 40 percent increase in area efficiency with 20 percent higher performance and 50 percent lower power consumption. The new process will help create products that push the boundaries in areas such as 5G, Artificial Intelligence, enterprise and hyperscale data centres, IoT, automotive and networking, said Samsung.