Along with UV grid lamp for uniformity, HELIOS-500 features digital process timer for accurate control and drawer loading sample stage that accommodates up to 5 x 5 in. substrates. Included pedestals allow for adjusting distance between UV source and substrate, while built-in hour-counter records total hours of UV lamp usage for maintenance purposes. Within minutes, system can achieve near atomically clean surfaces using 185 and 254 nm UV wavelengths and without damaging devices.
This story is related to the following:Chemical Processing and Waste ManagementUltraviolet (UV) Purification Systems | Cleaning Systems