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Twin Lab zones in on advanced MEMS

2013-11-27 09:25:24| Electronics - Topix.net

Building upon the Abu Dhabi-Singapore Joint Forum, the A*STAR Institute of Microelectronics , Globalfoundries and the Masdar Institute of Science and Technology have joined forces for a research programme, dubbed Twin Lab, dedicated to advancing micro-electro-mechanical systems ( Twin Lab will focus on the development of MEMS technologies including ... (more)

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Twin Lab zones in on advanced MEMS

2013-11-27 07:02:09| Semiconductors - Topix.net

Building upon the Abu Dhabi-Singapore Joint Forum, the A*STAR Institute of Microelectronics , Globalfoundries and the Masdar Institute of Science and Technology have joined forces for a research programme, dubbed Twin Lab, dedicated to advancing micro-electro-mechanical systems ( Twin Lab will focus on the development of MEMS technologies including ... (more)

Tags: advanced lab twin zones

 
 

Sand 9 Launches First Piezoelectric MEMS Timing Product For Communications Infrastructure, Industrial, Military Apps

2013-11-22 07:04:04| rfglobalnet Home Page

Sand 9, Inc. today became the first micro-electromechanical systems (MEMS) company to achieve the stringent low-noise, high-stability and harsh environmental requirements for precision timing in communications infrastructure, industrial and military applications.

Tags: product industrial communications military

 

Fairchild foresees trillion sensors MEMS market

2013-11-11 04:54:39| Semiconductors - Topix.net

Janusz Bryzek, VP of MEMS and sensor solutions at Fairchild Semiconductor, spoke to EE Times about what motivates chip companies to venture into the MEMS market.

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Dry Film Negative Photoresist targets MEMS applications.

2013-11-06 14:29:39| Industrial Newsroom - All News for Today

Optimized for hot roll lamination and processing on MEMS and IC wafers, DF-3020 Antimony-free Photoresist is available for sampling in 20 µm thickness, ±1 µm and can be manufactured from 5–25 µm thick. Film features glass transition temperature of 165°C and moderate modulus of 4 GPa at 25°C. Hydrophobic in nature, cured chemistry can withstand harsh environments including extreme moisture conditions and corrosive chemicals. This story is related to the following:Photoresists

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