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Home › Wafer Dryer includes HCl and HF injection capability.

 

Wafer Dryer includes HCl and HF injection capability.

2015-06-24 14:31:07| Industrial Newsroom - All News for Today

Available as option in fully automated Evolution wet processing systems and semi-automated Revolution batch wet processing systems, Genesis Xi Marangoni Dryer enables gentle, high-purity drying of semiconductor wafers with low particle contamination. Multistep oxide or ionic cleaning eliminates air interface, producing optimized surface conditioning with no damage to photoresist. Dryer minimizes use of Nitrogen gas and provides high drying performance in 7–20 min.

Tags: includes capability injection hcl

Category:Industrial Goods and Services

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